Overview: The NIL Consortium facilitates transparency and availability of NIL (NanoImprint Lithography) requirements and infrastructure, stamp/template standardization, materials qualification and defect control. The mission of NILCom is to develop a high volume manufacturing NIL platform in nano electronics, data storage, life sciences, and opto electronics by creating a technology interface for qualifying and standardizing the related infrastructure. NILCom has access to three centers for infrastructure qualification and process development. In Europe, AMO and EV Group cooperate on advanced UV-Nanoimprint lithography. On a worldwide basis, the NILCom infrastructure is complemented with NRC-IMI in North America and Waseda University in Japan from the process side.
Specifications: Not available
IPR Policy: Not available
Current Status: Active
Last Updated: February 12, 2014